Semiconductor device and method of diagnosing semiconductor device

ABSTRACT

A semiconductor device includes a logic circuit, a memory circuit having a plurality of first static memory cells formed by a transistor on the semiconductor substrate, a monitor circuit having a second static memory cell formed by a transistor on the semiconductor substrate, the monitor circuit being configured to apply stress to the second static memory cell during a period in which the semiconductor device operates so that a state of the second static memory cell can be notified, and a bus coupled with the logic circuit, the memory circuit and the monitor circuit, wherein a size of the transistor of one cell of the first static memory cells is substantively the same as that of the transistor of the second static memory cell.

CROSS-REFERENCE TO RELATED APPLICATION

The present application is a Continuation Application of U.S. patentapplication Ser. No. 15/365,572, filed on Nov. 30, 2016, which is basedon Japanese Patent Application No. 2015-243194 filed on Dec. 14, 2015,the content of which is hereby incorporated by reference into thisapplication.

TECHNICAL FIELD OF THE INVENTION

The present invention relates to a semiconductor device and a method ofdiagnosing the semiconductor device. More particularly, the presentinvention relates to a semiconductor device having a static memory and amethod of diagnosing the semiconductor device.

BACKGROUND OF THE INVENTION

As an example of a semiconductor device, a semiconductor device in whicha test circuit performing a diagnosis or others is previously embeddedis cited. As an example of the test circuit, a scan path or others iscited, the scan path supplying a test pattern as an input to a circuitblock in the semiconductor device such as a circuit block in accordancewith a user, and outputting an output from the circuit block. Asemiconductor device supplier (hereinafter, also referred to as asemiconductor manufacturer) that provides a user with a semiconductordevice and/or the user can detect whether a failure has occurred in asemiconductor device or not by using a test circuit such as a scan path.For example, the semiconductor manufacturer can detect a failure in asemiconductor device during a test process by using a test circuitbefore providing the semiconductor device. And, for example, whenconfiguring an electronic device by using a provided semiconductordevice, the user can detect a failure in the semiconductor device byusing a test circuit embedded in the semiconductor device. This testcircuit such as a scan path detects a failure that has occurred in asemiconductor device. That is, the test circuit detects a failure afterthe failure occurs. Therefore, when it is not easy to replace asemiconductor device or an electronic device using the semiconductordevice, even if the failure of the semiconductor device is detected, thesemiconductor device or the electronic device cannot be used for a longtime. In addition, in a semiconductor device used in a publicinfrastructure or others, even if a period of time from the detection ofthe failure to the replacement is short, this is a large impact. Atechnique relating to a failure in a semiconductor device is describedin, for example, Japanese Patent Application Laid-open Publication No.2014-235060 (Patent Document 1).

SUMMARY OF THE INVENTION

In a test circuit capable of detecting a failure after the failureoccurs, a period of time in which a semiconductor device or anelectronic device cannot be used is long, or a large impact is caused asdescribed above. Therefore, it is desirable to predict a failure beforethe failure occurs.

The Patent Document 1 describes that the failure is predicted byproviding a failure detecting circuit having the same configuration asthat of a practical operational circuit. However, this describes only aconcept, and does not describe a semiconductor device suitable forpredicting the failure.

The other object and novel characteristics of the present invention willbe apparent from the description of the present specification and theaccompanying drawings.

A semiconductor device according to one embodiment includes a pluralityof first static memory cells, a second static memory cell, and a logiccircuit, formed on the same semiconductor substrate. A storage circuitis formed of the plurality of first static memory cells. The secondstatic memory cell is provided to a monitor circuit. During a period inwhich the semiconductor device operates, stress is applied to the secondstatic memory cell, and a state of the second static memory cell isnotified.

The first static memory cells, the second static memory cell, and thelogic circuit are formed of the same transistor as one another.Therefore, when the stress is applied to, for example, the first staticmemory cells, the second static memory cell, and the logic circuit,characteristics of the transistor forming them vary as the same as oneanother. Therefore, by applying the stress to the second static memorycell to check the state of the second static memory cell, a state causedwhen the stress is applied to the first static memory cells and thelogic circuit can be estimated. Since the stress to the second staticmemory cell is applied during the period in which the semiconductordevice operates, for example, a user can estimate the state caused whenthe stress is applied to the first static memory cells and the logiccircuit, during the period in which the semiconductor device operates,so that the failures can be predicted.

From the second static memory cell, data of a logical valuecorresponding to a logical value of written data which is “0” or “1” isread. Therefore, the state of the second static memory cell to which thestress is applied can be checked by determining the logical value of theread data.

In terms of the determination of the logical value of the read data byreading the written data, it is conceivable that a memory provided inthe monitor circuit may be not the static memory cell but a dynamicmemory cell or an electrically rewritable nonvolatile memory cell. Inthe dynamic memory cell, electric charge corresponding to data isaccumulated in a capacitive element, so that the data is stored. Thetransistor configuring the logic circuit and the capacitive elementconfiguring the dynamic memory cell are different from each other interms of variation of the characteristics obtained when the stress isapplied thereto. Thus, the dynamic memory cell is not suitable for beingused to predict the failure.

In the electrically rewritable nonvolatile memory cell, for example,electrons corresponding to data are trapped by a specific insulatinglayer, so that the data is stored. The transistor configuring the logiccircuit does not have such a specific insulating layer. Thus, the logiccircuit and the electrically rewritable nonvolatile memory cell aredifferent from each other in terms of variation of characteristics whenthe stress is applied thereto. Therefore, the electrically rewritablenonvolatile memory cell is not suitable for being used to predict thefailure.

A method of diagnosing a semiconductor device according to oneembodiment includes: an operation step of operating a semiconductordevice including a logic circuit and a storage circuit having aplurality of first static memory cells; and a test step of applying astress to a second static memory cell during the operation step.

According to one embodiment, a semiconductor device suitable forpredicting a failure can be provided.

BRIEF DESCRIPTIONS OF THE DRAWINGS

FIG. 1 is a block diagram of a configuration of a semiconductor deviceaccording to a first embodiment;

FIG. 2 is a block diagram of a configuration of a monitor circuitaccording to the first embodiment;

FIGS. 3A and 3B are block diagrams of configurations of a static memoryand a monitor memory circuit according to the first embodiment,respectively;

FIGS. 4A and 4B are circuit diagrams of configurations of a logiccircuit and a memory cell to be used in the semiconductor deviceaccording to the first embodiment, respectively;

FIG. 5 is a flowchart of operation of the semiconductor device accordingto the first embodiment;

FIG. 6 is a flowchart of operation of a self-diagnosis functionaccording to the first embodiment;

FIG. 7 is a block diagram of a configuration of a monitor circuitaccording to a second embodiment;

FIG. 8 is a block diagram of a configuration of a monitor circuitaccording to a third embodiment;

FIG. 9 is a block diagram of a configuration of a monitor circuitaccording to a fourth embodiment;

FIGS. 10A and 10B are diagrams for describing the first embodiment andthe second embodiment;

FIGS. 11A and 11B are diagrams for describing the third embodiment andthe fourth embodiment;

FIG. 12 is a characteristic diagram for describing the first embodiment;and

FIG. 13 is a characteristic diagram for describing the first embodiment.

DESCRIPTIONS OF THE PREFERRED EMBODIMENTS

Hereinafter, embodiments of the present invention will be described indetail with reference to the accompanying drawings. Note that the samecomponents are denoted by the same reference symbols throughout all thedrawings for describing the embodiments, and the repetitive descriptionthereof will be omitted.

In the present specification, the explanation will be made whileexemplifying a semiconductor device required to have high reliabilitysuch as an on-vehicle semiconductor device which is mounted on a motorvehicle.

(First Embodiment)

<Entire Configuration of Semiconductor Device>

FIG. 1 is a block diagram of a configuration of a semiconductor deviceaccording to a first embodiment. In the drawing, a reference character“MCU” indicates the semiconductor device formed on one semiconductorsubstrate. Although the semiconductor device MCU has a plurality ofcircuit blocks, FIG. 1 illustrates a part of the plurality of circuitblocks. Regarding the circuit blocks illustrated in FIG. 1, each of thecircuit blocks is formed of an insulating gate field effect transistor(hereinafter, also referred to as a MOSFET or simply as a transistor) onthe same semiconductor substrate, the insulating gate field effecttransistor being formed by a publicly-known semiconductor manufacturingtechnique although described later. The semiconductor device MCU has aplurality of external terminals for electrically connecting to theoutside of the semiconductor device MCU. Some external terminals of theplurality of external terminals are illustrated with circles in FIG. 1.

Circuit blocks CPU, SRAM, FLASH, PEP, MON, I/O-P, and CNT areillustrated in FIG. 1 as the circuit blocks forming the semiconductordevice MCU. Here, a reference character “CPU” indicates a centralprocessing circuit, a reference character “RAM” indicates a staticmemory (a storage circuit), a reference character “FLASH” indicates anelectrically rewritable nonvolatile memory (hereinafter, also referredto as a nonvolatile memory), a reference character “PEP” indicates auser circuit, a reference character “I/O-P” indicates an input/outputcircuit, a reference character “MON” indicates a monitor circuit, and areference character “CNT” indicates a control circuit. In FIG. 1, areference character “BUS” indicates a bus, and each of referencecharacters “TVd”, “TVs”, “TIO”, “TCN”, and “TMN” indicates an externalterminal. The central processing circuit CPU, the static memory SRAM,the nonvolatile memory FLASH, the user circuit PEP, and the monitorcircuit MON are connected to the bus BUS, and they transmit/receive datato/from one another through the bus BUS although not particularlylimited.

The nonvolatile memory FLASH includes a plurality of nonvolatile memorycells, and stores a program, data, and others. The central processingcircuit CPU reads, for example, the program stored in the nonvolatilememory FLASH and operates in accordance with the read program.

The static memory SRAM includes a plurality of static memory cells(first static memory cells) although described in detail later. Forexample, the static memory SRAM temporarily stores the data when thecentral processing circuit CPU executes the program and stores anexecuted result.

The user circuit PEP is a circuit provided to achieve a function to bedesired by a user in the semiconductor device MCU, and is, for example atimer circuit, a counter circuit, a serial communication circuit, ananalog/digital conversion circuit, a data transfer circuit, and others.That is, the user circuit PEP is a circuit corresponding to the user.The user circuit PEP is connected to the external terminal (aninput/output terminal) TIO through the input/output circuit I/O-P. Forexample, an input signal supplied to the input/output terminal TIO issupplied to the user circuit PEP through the input/output circuit I/O-P.In the user circuit PEP, the supplied input signal is subjected to aprocessing corresponding to the function to be desired by the user, andis supplied to, for example, the central processing circuit CPU throughthe bus BUS as data. To the supplied data, the central processingcircuit CPU performs a processing in accordance with the program. Thedata processed by the central processing circuit CPU is supplied to, forexample, the user circuit PEP again, and the user circuit PEP outputsthe supplied data, as an output signal, from the input/output terminalTIO through the input/output circuit I/O-P.

Since the monitor circuit MON and the control circuit CNT will bedescribed in detail later, only their outlines will be described here.The monitor circuit MON has a static memory cell (a second static memorycell) having the same configuration as that of the static memory cellincluded in the static memory SRAM. In accordance with an instructionfrom the control circuit CNT, the monitor circuit MON applies a stressto the static memory cell included in the monitor circuit MON during aperiod in which the semiconductor device MCU operates, and outputs astate of the static memory cell from the external terminal TMN.

The plurality of static memory cells forming the static memory SRAM andthe static memory cell included in the monitor circuit MON have the sameconfiguration as each other. However, in order to distinguish both ofthe memory cells, each of the plurality of static memory cells formingthe static memory SRAM is referred to as the first static memory cell orsimply as a first memory cell. On the other hand, the static memory cellincluded in the monitor circuit MON is referred to as the second staticmemory cell or simply as a second memory cell. When there is no need todistinguish both of the static memory cells, both of the static memorycells are simply referred to as static memory cells or memory cells soas to be included therein.

Note that each of the central processing circuit CPU and the usercircuit PEP includes a plurality of logic circuits, and thus can beregarded as a logic circuit.

In FIG. 1, the external terminal TVd indicates a power source terminalto which a predetermined power source voltage Vd (a first voltage) issupplied, and the external terminal TVs indicates a power sourceterminal to which a ground voltage Vs of the circuit is supplied.According to the first embodiment, the power source voltage Vd and theground voltage Vs are supplied to the central processing circuit CPU,the static memory SRAM, the nonvolatile memory FLASH, the user circuitPEP, the input/output circuit I/O-P, the monitor circuit MON, and thecontrol circuit CNT. These circuit blocks operate with the power sourcevoltage Vd as an operating voltage. Of course, a voltage conversioncircuit may be provided in the semiconductor device MCU so that thepower source voltage Vd supplied to the power source terminal TVd isdropped or boosted, and the power source voltage acquired by thedropping or the boosting is supplied to these circuit block circuits asthe power source voltage Vd by the voltage conversion circuit.

In FIG. 1, the external terminal TCN indicates an external terminal towhich the control data is supplied, and the control data supplied to theexternal terminal TCN is supplied to the control circuit CNT. Forexample, the control circuit CNT transmits the supplied control data tothe monitor circuit MON so as to set the monitor circuit MON.

<Configuration of Monitor Circuit>

FIG. 2 is a block diagram of a configuration of the monitor circuit MONaccording to the first embodiment. For the convenience of description,note that FIG. 2 also illustrates the control circuit CNT. In order toavoid a state in which the drawing is complicated, the ground voltage Vsto be supplied to the monitor circuit MON and the control circuit CNT isomitted, and only the power source voltage Vd commonly supplied theretois clearly illustrated in FIG. 2.

The monitor circuit MON includes a monitor memory circuit MON-S, astress voltage generating circuit STVC, a pattern generating circuitPTG, a test circuit BIST, a cell original-performance storage registerMCRG, a stress time register STRG, a timer circuit TMC, and a monitorcontrol circuit MON-CN. According to the first embodiment, the powersource voltage Vd is supplied to the stress voltage generating circuitSTVC, the pattern generating circuit PTG, the test circuit BIST, thecell original-performance storage register MCRG, the stress timeregister STRG, the timer circuit TMC, and the monitor control circuitMON-CN as an operating voltage. To the monitor memory circuit MON-S, astress voltage Vst (a second voltage) generated by the stress voltagegenerating circuit STVC is supplied as an operation power sourcevoltage. In order to avoid a state in which the drawing is complicated,note that FIG. 2 clearly illustrates the supply of the power sourcevoltage Vd only for the monitor control circuit MON-CN and the stressvoltage generating circuit STVC.

To the stress voltage generating circuit STVC, a voltage control signalVcnt is supplied from the monitor control circuit MON-CN so as to changea voltage value of the stress voltage Vst formed in accordance with thevoltage control signal Vcnt. According to the first embodiment, thestress voltage generating circuit STVC includes a power source boostingcircuit UVC and a power source dropping circuit DVC. The power sourceboosting circuit UVC and the power source dropping circuit DVCselectively operate in accordance with the voltage control signal Vcnt.That is, the monitor control circuit MON-CN instructs the stress voltagegenerating circuit STVC to apply a stress or perform self-diagnosis byusing the voltage control signal Vcnt.

When the instruction for stress application is issued to the stressvoltage generating circuit STVC through the voltage control signal Vcnt,the power source boosting circuit UVC in the stress voltage generatingcircuit STVC operates. The power source boosting circuit UVC boosts thepower source voltage Vd, forms a voltage having a voltage value higherthan that of the power source voltage Vd, and supplies the formedvoltage to the monitor memory circuit MON-S as the stress voltage Vst.On the other hand, when the instruction for self-diagnosis is issued tothe stress voltage generating circuit STVC through the voltage controlsignal Vcnt, the power source dropping circuit DVC in the stress voltagegenerating circuit STVC operates. The power source dropping circuit DVCdrops the power source voltage Vd, forms a voltage having a voltagevalue lower than that of the power source voltage Vd, and supplies theformed voltage to the monitor memory circuit MON-S as the stress voltageVst. That is, in accordance with the voltage control signal Vcnt, thestress voltage generating circuit STVC supplies the voltage having avoltage value higher than that of the power source voltage Vd or thevoltage having a voltage value lower than that of the power sourcevoltage Vd to the monitor memory circuit MON-S as the stress voltageVst.

In the present specification, note that a voltage value is expressedwith “high” or “low”. The “high” means that an absolute value of thevoltage value is “large”, and the “low” means that the absolute value ofthe voltage value is “small”.

The pattern generating circuit PTG operates in accordance with a testpattern control signal Pcnt from the monitor control circuit MON-CN. Themonitor control circuit MON-CN issues an instruction of whether themonitor memory circuit MON-S is to be tested or not by using the testpattern control signal Pcnt. When the test pattern control signal Pcntassigns the test (diagnosis) of the monitor memory circuit MON-S, thepattern generating circuit PTG generates a test pattern (an operatingpattern in the test) for operating the monitor memory circuit MON-S. Thetest pattern generated by the pattern generating circuit PTG is suppliedto the test circuit BIST.

According to the first embodiment, the test circuit BIST has twofunctions. That is, the test circuit BIST has a stress applying functionfor operating the monitor memory circuit MON-S and a self-diagnosisfunction for diagnosing the monitor memory circuit MON-S in accordancewith the test pattern supplied from the pattern generating circuit PTG.It is determined which one of the stress applying function and theself-diagnosis function operates by the test control signal Tcnt fromthe monitor control circuit MON-CN.

That is, the stress applying function or the self-diagnosis functionoperates depending on a case in which the monitor control circuit MON-CNassigns the stress application or the self diagnosis by using the testcontrol signal Tcnt.

The cell original-performance storage resister MCRG is a register thatstores data for determining the voltage value of the voltage formed bythe power source dropping circuit DVC. The data is set in the celloriginal-performance storage register MCRG before a semiconductormanufacturer provides the user with the semiconductor device MCU (shipsthe semiconductor device to the user). For example, in a test processbefore the shipment, the semiconductor manufacturer examines the secondmemory cell forming the monitor memory circuit MON-S so as to acquire alower limit operating voltage with which the second memory cell isoperable. The acquired operable lower limit operating voltage is storedin the cell original-performance storage register MCRG as a lower limitoriginal-performance value (data) of the second memory cell.

The lower limit original-performance data stored in the celloriginal-performance storage register MCRG is supplied to the monitorcontrol circuit MON-CN. The monitor control circuit MON-CN determinesthe voltage value formed by the power source dropping circuit DVC, basedon the supplied lower limit original-performance data. The power sourcedropping circuit DVC lowers the power source voltage Vd so as to formthe voltage value based on the lower limit original-performance data,and therefore, the voltage based on the lower limit original-performancedata has a voltage value lower than that of the power source voltage Vdto be supplied to the static memory SRAM or others illustrated inFIG. 1. That is, when the user operates the semiconductor device MCU,the voltage having a voltage value lower than that of the power sourcevoltage Vd to be supplied to the static memory SRAM or others issupplied to the monitor memory circuit MON-S as the stress voltage Vst.

The cell original-performance storage register MCRG may be a volatilememory, but is desirably formed of a nonvolatile memory. For example,the cell original-performance storage register MCRG is formed of anelectrically rewritable fuse such as a so-called eFUSE, or anelectrically rewritable nonvolatile memory (such as a so-called flashmemory). For example, the lower limit original-performance data is setfor the cell original-performance storage register MCRG by the supply ofthe acquired lower limit original-performance data to the monitorcircuit MON through the external terminal TCN (FIG. 1) and the controlcircuit CNT by the semiconductor manufacturer. In this case, thesupplied lower limit original-performance data is supplied from thecontrol circuit CNT to the monitor control circuit MON-CN, and besides,is supplied from the monitor control circuit MON-CN to the celloriginal-performance storage register MCRG, and then is set. Thissetting corresponds to programming (writing) of the data to the eFUSE orthe flash memory when the cell original-performance storage registerMCRG is formed of the eFUSE or the flash memory.

The monitor control circuit MON-CN starts the operation in response to atrigger signal Tg from the control circuit CNT. That is, the triggersignal Tg is supplied from the control circuit CNT to the monitorcontrol circuit MON-CN so that the stress application to the monitormemory circuit MON-S starts.

For example, by the supply of the trigger signal Tg, the monitor controlcircuit MON-CN instructs the stress voltage generating circuit STVC toapply the stress through the voltage control signal Vcnt. The monitorcontrol circuit MON-CN assigns the test to the pattern generatingcircuit PTG through the test pattern control signal Pcnt, and besides,the monitor control circuit MON-CN assigns the test circuit BIST tooperate the stress applying function through the test control signalTcnt.

Accordingly, the power source boosting circuit UVC operates and suppliesthe stress voltage Vst having a voltage value higher than that of thepower source voltage Vd, to the monitor memory circuit MON-S. At thistime, the pattern generating circuit PTG generates the test pattern, andthe test circuit BIST accesses the monitor memory circuit MON-S inaccordance with the supplied test pattern. Therefore, the monitor memorycircuit MON-S operates while using the stress voltage Vst having avoltage value higher than that of the power source voltage Vd as theoperating voltage in accordance with the access from the test circuitBIST. When the second memory cell in the monitor memory circuit MON-S isobserved at this time, the data is written to and/or read from thesecond memory cell in accordance with the test pattern in a state inwhich the stress voltage Vst having a voltage value higher than that ofthe power source voltage Vd is applied. Therefore, the stress is appliedto the second memory cell in the monitor memory circuit MON-S.

After the data writing operation and/or reading operation is performedto the second memory cell in a state in which the stress voltage Vsthigher than the power source voltage Vd is applied during apredetermined period, the monitor control circuit MON-CN instructs thestress voltage generating circuit STVC to perform the self-diagnosisthrough the test pattern control signal Vcnt. The monitor controlcircuit MON-CN instructs the pattern generating circuit PTG to performthe test through the test pattern control signal Pcnt, and to assign theoperation of the self-diagnosis function to the test circuit BISTthrough the test control signal Tcnt.

Accordingly, the power source dropping circuit DVC operates and suppliesthe stress voltage Vst having a voltage value lower than that of thepower source voltage Vd, to the monitor memory circuit MON-S. Thevoltage value of the stress voltage Vst at this time is determined bythe lower limit original-performance data stored in the celloriginal-performance storage register MCRG. The test circuit BISTaccesses the monitor memory circuit MON-S, writes/reads the data to/fromthe monitor memory circuit MON-S, and then, diagnoses the monitor memorycircuit MON-S. The diagnosis is performed by writing the data into thesecond memory cell in the monitor memory circuit MON-S, then reading thedata, comparing the written data and the read data, determining that aresult of the diagnosis is passed when the data is matched with theother data, or determining that the result of the diagnosis is failedwhen the data is not matched with the other data.

The result of the diagnosis by the test circuit BIST is supplied to themonitor control circuit MON-CN. The monitor control circuit MON-CNincludes a diagnosis result register (a retaining circuit) MNRG. Theresult of the diagnosis by the test circuit BIST is stored in thediagnosis result register MNRG, and the result of the diagnosis storedin the diagnosis result register MNRG is output as a diagnosis resultsignal TCN-2 from the external terminal TMN illustrated in FIG. 1.

As described above, the monitor control circuit MON-CN applies thestress to the monitor memory circuit MON-S and performs theself-diagnosis when the trigger signal Tg is supplied thereto. Thecontrol circuit CNT generates the trigger signal Tg when, for example,the user supplies the power source voltage Vd to the semiconductordevice MCU. That is, the trigger signal Tg is generated when the useroperates the semiconductor device MCU. Accordingly, when thesemiconductor device MCU starts to operate, the stress application andthe self-diagnosis are continuously performed to the monitor memorycircuit MON-S during a period in which the semiconductor device MCUoperates.

However, each of the circuit blocks in the semiconductor device MCU (forexample, the user circuit PEP, the static memory SRAM, the centralprocessing circuit CPU, and others illustrated in FIG. 1) does notcontinuously operate during the period in which the user operates thesemiconductor device MCU. That is, a period in which each of the circuitblocks operates is not 100% of the period in which the semiconductordevice MCU operates. For example, data writing or reading operation isnot continuously performed to the static memory SRAM during the periodin which the semiconductor device MCU operates.

According to the first embodiment, when the stress is applied to themonitor memory circuit MON-S, the stress voltage Vst having a voltagevalue higher than that of the power source voltage Vd is supplied to themonitor memory circuit MON-S as a power source voltage. Therefore, forexample, when the static memory SRAM is exemplified, the stress receivedby the monitor memory circuit MON-S is stronger than stress received bythe static memory SRAM during the period in which the semiconductordevice MCU operates. In other words, acceleration stress thataccelerates the stress in terms of time is applied to the monitor memorycircuit MON-S.

Therefore, when the acceleration stress is continuously applied to themonitor memory circuit MON-S during the period in which thesemiconductor device MCU operates, it is thought that stress applied istoo larger than the stress received by the static memory SRAM during theperiod in which the semiconductor device MCU operates.

According to the first embodiment, the monitor circuit MON includes thetimer circuit TMC although not particularly limited thereto. When thestress is applied to the monitor memory circuit MON-S in accordance withthe trigger signal Tg, the monitor control circuit MON-CN performs thecontrol so that the stress is applied to the monitor memory circuitMON-S during a predetermined period (stress application time) by usingthe timer circuit TMC. For example, the period in which thesemiconductor device MCU operates is assumed to be 100%, and the controlis performed by using the timer circuit TMC so that the stress isapplied to the monitor memory circuit MON-S during a period of 50% thatis half of the period.

The period of time in which the stress is applied to the monitor memorycircuit MON-S (the stress application time) varies for each type of thesemiconductor device provided to the user and/or for each user.Therefore, the stress application time is supplied from the outside ofthe semiconductor device MCU so as to be set. According to the firstembodiment, the stress time register STRG having the same configurationas that of the cell original-performance storage register MCRG isprovided to the monitor circuit MON. For example, the stress applicationtime is previously determined by the semiconductor manufacturer before,for example, the user is provided with the semiconductor device MCU, andthe semiconductor manufacturer stores the previously-determined stressapplication time in the stress time register STRG via the externalterminal TCN, the control circuit CNT and the monitor control circuitMON-CN during the test process before the shipment of the semiconductordevice MCU. The period of time in which the stress is applied iscontrolled by the period of time measured by the time circuit TMC andthe stress application time stored in the stress time register STRG.

When the stress applying function operates in the text circuit BIST, thestress voltage Vst having a voltage value higher than that of theoperating power source voltage Vd for operating other circuit blocks(the user circuit PEP, the static memory circuit SRAM, and others)illustrated in FIG. 1 is supplied to the monitor memory circuit MON-S asan operating power source voltage. That is, the data is written/readto/from the second memory cell in the monitor memory circuit MON-S in astate in which the stress voltage Vst having a voltage value higher thanthat of the power source voltage Vd is supplied as the operatingvoltage. Accordingly, degradation of characteristics of the secondmemory cell in the monitor memory circuit MON-S is accelerated in termsof time more than those of the other circuit blocks.

Meanwhile, when the self-diagnosis function operates in the test circuitBIST, the stress voltage Vst having a voltage value lower than that ofthe operating power source voltage Vd for operating the other circuitblocks illustrated in FIG. 1 is supplied to the monitor memory circuitMON-S as an operating power source voltage. Furthermore, the value ofthe stress voltage Vst at this time corresponds to the lower limitvoltage with which the second memory cell in the monitor memory circuitMON-S is operable. That is, the data is written/read to/from the secondmemory cell in the monitor memory circuit MON-S in a state in which thestress voltage Vst having a voltage value (a voltage value correspondingto the lower limit voltage) lower than that of the power source voltageVd is supplied as the operating voltage. Accordingly, in theself-diagnosis, a diagnosis can be performed based on an originalperformance (the operable lower limit voltage) originally provided tothe second memory cell. That is, during the period in which thesemiconductor device MCU operates, the acceleration stress thataccelerates the degradation of the characteristics in terms of time isapplied to the second memory cell in the monitor memory circuit MON-S,and the self-diagnosis based on the provided original performance isperformed.

By the operation of the semiconductor device MCU, the time degradationof the characteristics is caused, resulting in a failure in thesemiconductor device MCU. According to the first embodiment, inaccordance with the period of time in which the semiconductor device MCUoperates, the acceleration stress is applied to the second memory cellin the monitor memory circuit MON-S so that the self-diagnosis isperformed based on the original performance. Accordingly, the timedegradation of the characteristics of the second memory cell can beaccurately detected before the failure occurs in the semiconductordevice MCU due to the time degradation of the characteristics. As aresult, since the time degradation of the characteristics of the secondmemory cell can be accurately detected before the failure occurs in thesemiconductor device MCU due to the time degradation of thecharacteristics, the failure in the semiconductor device MCU can bepredicted or estimated.

According to the first embodiment, each circuit block such as the usercircuit PEP, the static memory circuit SRAM, and the central processingcircuit CPU illustrated in FIG. 1 is formed of a MOSFET. Similarly, themonitor memory circuit MON-S is also formed of a MOSFET. Even when aMOSFET operates while a voltage lower than its breakdown voltage issupplied thereto, characteristics of the MOSFET temporally change alongwith time elapses. For example, a gate oxide film of the MOSFET degradesdue to the temporal change. A threshold voltage of the MOSFET alsochanges due to the temporal change. That is, the characteristics of theMOSFET degrade due to the temporal change. In this manner, due to thedegradation of the characteristics of the MOSFET, characteristics ofeach circuit block formed of the MOSFET also degrade. As a result,characteristics of the semiconductor device MCU also temporally change.

The second memory cell in the monitor memory circuit MON-S is formed ofthe same MOSFET as the MOSFET forming each of the other circuit blocks.According to the first embodiment, the acceleration stress is applied tothe second memory cell in the monitor memory circuit MON-S, namely, theMOSFET forming the second memory cell. This manner simulates a state inwhich the MOSFET forming each of the other circuit blocks operates for along time while the power source voltage Vd lower than the breakdownvoltage is supplied. In the self-diagnosis, a diagnosis is performed ina state in which the operable lower limit original-performance operatingvoltage is supplied to the second memory cell in the monitor memorycircuit MON-S. This corresponds to a diagnosis of whether or not theMOSFET that has operated for a long time under the supply of the powersource voltage Vd operates under the operable operating voltage. As aresult, the temporal change of the characteristics of each circuit blockformed of the MOSFET can be accurately predicted by the test circuitBIST, so that the failure can be predicted.

According to the first embodiment, note that a signal TCN-1 is suppliedfrom the monitor control circuit MON-CN to the control circuit CNT. Thedata stored in the cell original-performance storage register MCRG, thestress time register STRG, and the diagnosis result register MNRG aresupplied to the control circuit CNT as the signal TCN-1. Accordingly,the original-performance lower limit data stored in the celloriginal-performance storage register MCRG and the stress applicationtime stored in the stress time register STRG can be read from theexternal terminal TCN illustrated in FIG. 1.

<Static Memory and Monitor Memory Circuit>

FIGS. 3A and 3B are block diagrams of configurations of the staticmemory SRAM and the monitor memory circuit MON-S according to the firstembodiment, respectively.

<<Configuration of Static Memory>>

FIG. 3A is the block diagram of the configuration of the static memorySRAM. In FIG. 3A, the static memory SRAM includes a memory array MCA anda peripheral circuit MC-CN. The memory array MCA includes a plurality offirst memory cells MC, a plurality of data line pairs d0, /d0 to dn,/dn, and a plurality of word lines WO to Wn. The plurality of firstmemory cells MC are arranged in a matrix so that the data line pairs d0,/d0 to d0, /dn are arranged in the respective columns, and so that theword lines W0 to Wn are arranged in the respective rows. In the memoryarray MCA, the plurality of first memory cells MC arranged in each ofthe rows is connected to the word line arranged in each of the rows. Inthe memory array MCA, the plurality of first memory cells MC arranged ineach of the columns is connected to the data line pair arranged in eachof the columns.

In order to prevent the drawing from being complicated, in the memoryarray MCA, FIG. 3A clearly illustrates only a first memory cell MCarranged in a 0-th row and a 0-th column, a first memory cell MCarranged in the 0-th row and an n-th column, a first memory cell MCarranged in an n-th row and the 0-th column, and a first memory cell MCarranged in the n-th row and the n-th column among the plurality offirst memory cells MC arranged in the matrix. While exemplifying theseclearly-illustrated first memory cells MC, connection relations amongthe word lines, the data line pairs, and the first memory cells MC willbe described as follows.

In the memory array MCA, the plurality of first memory cells MC arrangedin the 0-th row are connected to the word line W0 arranged in the same0-th row. To the word line Wn arranged in the n-th row, the plurality offirst memory cells MC arranged in the same n-th row are also connected.To the data line pair d0, /d0 arranged in the 0-th column, the pluralityof first memory cells MC arranged in the 0-th column are connected. Tothe data line pair dn, /dn arranged in the n-th column, the plurality offirst memory cells MC arranged in the n-th column are connected.Similarly, to the word lines W1 to Wn-1 (not illustrated) arranged inthe rest of the respective first row to (n−1)th row, the plurality offirst memory cells MC (not illustrated) arranged in the same first rowto the (n−1)th row are connected. Similarly, to the data line pairs d1,/d1 to dn-1, /dn-1 (not illustrated) arranged in the rest of therespective first column to the (n−1)th column, the plurality of firstmemory cells MC (not illustrated) arranged in the same first column tothe (n−1)th column are connected.

From a different point of view, in the memory array MCA, the firstmemory cell MC is arranged at each intersection between the word linesW0 to Wn and the data line pairs d0, /d0 to dn, /dn.

Here, the data line pairs d0, /d0 to dn, /dn include pairs of data linesd0 to dn and data lines /d0 to /dn, respectively. When data is read froma first memory cell MC, one data line d0 out of the pair of data lines(for example, d0 and /d0) forming the data line pair changes in adirection of the power source voltage Vd (or in a direction of theground voltage Vs) and the other data line /d0 changes in the directionof the ground voltage Vs (or in the direction of the power sourcevoltage Vd) in accordance with the data to be read. Similarly, when datais written in the first memory cell MC, the one data line d0 changes inthe direction of the power source voltage Vd (or in the direction of theground voltage Vs) and the other data line /d0 changes in the directionof the ground voltage Vs (or in the direction of the power sourcevoltage Vd) in accordance with the data to be written. That is, duringthe data reading and writing, the voltages of the data line pair d0, /d0complementarily change.

To the peripheral circuit MC-CN, an address signal Add, a write-enablesignal WE, and a read-enable signal RE are supplied through the bus BUSillustrated in FIG. 1. Data is input into/output to/from the peripheralcircuit MC-CN through the bus BUS. In FIG. 3A, the data to be input isdenoted with input data DI, and the data to be output is denoted withoutput data DO. To the peripheral circuit MC-CN, the power sourcevoltage Vd and the ground voltage of the circuit are supplied.

The peripheral circuit MC-CN is connected to the word lines W0 to Wn andthe data line pairs d0, /d0 to dn, /dn. The plurality of first memorycells MC have the same configuration as each other. Since the exemplaryconfiguration of the first memory cell MC will be described in detaillater, only an outline will be described here. The first memory cell MCincludes a power source voltage node N1 (not illustrated) and a groundvoltage node N2 (not illustrated). The ground voltage Vs is supplied tothe ground voltage node N2, and the predetermined power source voltageis supplied to the power source voltage node N1. The first memory cellMC operates while taking the predetermined voltage as a power sourcevoltage. As described above, the first memory cell MC is connected to aword line arranged in a row in which this first memory cell MC isarranged, and to a data line pair arranged in a column in which thisfirst memory cell MC is arranged.

When the data is read from the first memory cell MC, for example, ahigh-level selection signal is supplied from the peripheral circuitMC-CN to the word line connected to this first memory cell MC in a statein which the predetermined power source voltage is supplied to the powersource voltage node N1. Accordingly, the voltage of the data line pairchanges in accordance with the data stored in this first memory cell MC.Meanwhile, when the data is written in the first memory cell MC, forexample, the peripheral circuit MC-CN causes one data line of the dataline pair to be at a high level (or at a low level) and causes the otherdata line to be at the low level (or at the high level) in accordancewith the data to be written. The word line is made to be at the highlevel, so that the data corresponding to a state in which the one dataline is made to be at the high level and the other data line is made tobe at the low level, is stored in the first memory cell MC.

In the explanation using the first memory cell MC arranged in the 0-throw and the 0-th column illustrated in FIG. 3A, when data is read, theperipheral circuit MC-CN supplies the high-level selection signal to theword line W0. Accordingly, the voltages of the data line pair d0, /d0are determined in accordance with the data stored in the first memorycell MC. When data is written, the peripheral circuit MC-CN causes thedata line d0 to be at the high level and causes the data line /d0 to beat the low level in accordance with the data to be written. At thistime, the peripheral circuit MC-CN supplies the high-level selectionsignal to the word line W0, so that a state in which the data line d0 ismade to be at the high level and the data line /d0 is made to be at thelow level, is stored in the first memory cell MC. That is, the data iswritten in the first memory cell MC.

According to the first embodiment, as the predetermined power sourcevoltage, the power source voltage Vd is supplied to a power sourcevoltage node N1 of each of the plurality of the first memory cells MCarranged in the memory array MCA of the static memory SRAM, and theground voltage Vs of the circuit is supplied to a ground voltage nodeN2. Note that FIG. 3A illustrates a state in which the power sourcevoltage Vd and the ground voltage Vs are supplied from the peripheralcircuit MC-CN to the power source voltage node N1 and the ground voltagenode N2 of each of the first memory cells. However, the embodiment isnot limited to this state.

The address signal Add, the write-enable signal WE, and the read-enablesignal RE, which are supplied to the peripheral circuit MC-CN, areoutput when, for example, the central processing circuit CPU (FIG. 1)accesses the static memory SRAM. That is, the central processing circuitCPU outputs the address signal Add for assigning one (or a plurality of)first memory cell MC into/from which the data is to be written/read,from the plurality of first memory cells MC included in the staticmemory SRAM. Here, when the data is written, the central processingcircuit CPU causes the write-enable signal WE to be, for example, at thehigh level. When the data is read, the central processing circuit CPUcauses the read-enable signal RE to be at the high level. These signalsoutput from the central processing circuit CPU are supplied to thestatic memory SRAM through the bus BUS.

The peripheral circuit MC-CN selects a word line assigned with thesupplied address signal Add, from the plurality of word lines W0 to Wn,and selects one (or a plurality of) data line pair assigned with thesupplied address signal Add, from the plurality of data line pairs d0,/d0 to dn, /dn. The peripheral circuit MC-CN supplies the high-levelselection signal to the selected word line. When the write-enable signalWE is at the high level, the peripheral circuit MC-CN supplies the datain the bus BUS to the selected data line pair as input data DI.Accordingly, the data in the bus BUS is written into the first memorycell MC.

On the other hand, when the read-enable signal RE is at the high level,the peripheral circuit MC-CN causes the selection signal for selectingthe word line assigned with the address signal Add, to be at the highlevel, selects the data line pair assigned with the address signal Add,and supplies the data in the selected data line pair to the bus BUS asoutput data DO. Accordingly, the data is read from the first memorycell.

<<Configuration of Monitor Memory Circuit>>

FIG. 3B is the block diagram of the configuration of the monitor memorycircuit MON-S. In FIG. 3B, the monitor memory circuit MON-S includes thesecond memory cell MC-S and a peripheral circuit MCS-CN. The secondmemory cell MC-S has the same configuration as that of each of the firstmemory cells MC included in the static memory SRAM. The peripheralcircuit MCS-CN has a configuration similar to that of the peripheralcircuit MC-CN included in the static memory SRAM. Here, differences fromthe static memory SRAM will be mainly described.

First, the second memory cell MC-S will be described. The configurationof the second memory cell MC-S has the same configuration as that ofeach of the first memory cells MC. However, a predetermined voltage tobe supplied to a power source voltage node N1, is different from that ofthe first memory cells MC. That is, instead of the power source voltageVd, the stress voltage Vst is supplied to the power source voltage nodeN1 of the second memory cell MC-S as the predetermined voltage. Notethat the ground voltage Vs is supplied to a ground voltage node N2 ofthe second memory cell MC-S as similar to the first memory cells MC.FIG. 3B also illustrates a state in which the stress voltage Vst and theground voltage Vs are supplied to the second memory cell MC-S throughthe peripheral circuit MCS-CN. However, the embodiment is not limited tothis state.

To the peripheral circuit MCS-CN, the ground voltage Vs is supplied assimilar to the peripheral circuit MC-CN. Meanwhile, as a power sourcevoltage, to the peripheral circuit MCS-CN, the stress voltage Vs insteadof the power source voltage Vd is supplied as different from theperipheral circuit MC-CN. Therefore, the peripheral circuit MCS-CNoperates while taking the stress voltage Vst as the power sourcevoltage. According to the first embodiment, the monitor memory circuitMON-S has only one second memory cell MC-S as a memory cell although notparticularly limited. Therefore, to the peripheral circuit MCS-CN, theaddress signal Add is not supplied but a write-enable signal (a monitorwrite-enable signal) WES and a read-enable signal (a monitor read-enablesignal) RES are supplied as different from the peripheral circuit MC-CN.In FIG. 3B, a reference character “DIS” indicates input data (monitorinput data) to be supplied to the monitor memory circuit MON-S. Areference character “DOS” indicates output data (monitor output data) tobe output from the monitor memory circuit MON-S. In FIG. 3B, a referencecharacter “ds, /ds” indicates a data line pair connected to the secondmemory cell MC-S, and a reference character “WS” indicates a word lineconnected to the second memory cell MC-S.

The stress voltage Vst to be supplied to the peripheral circuit MCS-CNand the second memory cell MC-S is supplied from the stress voltagegenerating circuit STVC illustrated in FIG. 2. The write-enable signalWES, the read-enable signal RES, and the input data DIS are suppliedfrom the test circuit BIST illustrated in FIG. 2, and the output dataDOS is supplied to the test circuit BIST.

Next, operation of the monitor memory circuit MON-S will be described.

When the test circuit BIST (FIG. 2) performs the stress applyingfunction through the instruction from the monitor control circuit MON-CN(FIG. 2), the data in accordance with the test pattern formed by thepattern generating circuit PTG is supplied from the test circuit BIST tothe monitor memory circuit MON-S as the input data DIS. At this time,the test circuit BIST causes the write-enable signal WES to be at thehigh level in accordance with the above-described test pattern. Forexample, in accordance with the test pattern, the test circuit BISTperiodically causes the write-enable signal WES to be at the high level.

At this time, the power source boosting circuit UVC in the stressvoltage generating circuit STVC is operated by the instruction from themonitor control circuit MON-CN. Because of the operation of the powersource boosting circuit UVC, the power source voltage Vd is boosted bythe power source boosting circuit UVC, a voltage having a voltage valuehigher than that of the power source voltage Vd is formed, and thestress voltage Vst is supplied to the peripheral circuit MCS-CN and thesecond memory cell MC-S in the monitor memory circuit MON-S as eachoperating voltage.

In response to the high-level write-enable signal WES, the peripheralcircuit MCS-CN causes the word line WS to be at the high level, andsupplies a voltage corresponding to the input data DIS in accordancewith the test pattern being supplied at that time, to the data line pairds, /ds. Accordingly, into the second memory cell MC-S, datacorresponding to the input data DIS is written in a state in which thestress voltage Vst is supplied as the operating voltage. In this manner,in accordance with the test pattern, every time the write-enable signalWES supplied to the peripheral circuit MC-CN changes so as to be at thehigh level, the data corresponding to the input data DIS at that time iswritten into the second memory cell MC-S to which the stress voltage Vstis being supplied.

When performing the stress applying function, the test circuit BISTcauses the read-enable signal RES to be at the high level. For example,after the write-enable signal WES is periodically caused to be at thehigh level as described above, the text circuit BIST periodically causesthe read-enable signal RES to be at the high level. Needless to say, forexample, the embodiment is not limited to this, and the test circuitBIST may alternately cause the read-enable signal RES and thewrite-enable signal WES to be at the high level.

The stress voltage Vst having a voltage value higher than that of thepower source voltage Vd is supplied to the peripheral circuit MCS-CN andthe second memory cell MC-S in the monitor memory circuit MON-S as eachoperating voltage.

The peripheral circuit MCS-CN causes the word line WS to be at the highlevel in response to the high-level read-enable signal RES. Accordingly,the second memory cell MC-S sets the voltage of the data line pair ds,/ds to be a value in accordance with the data stored in the secondmemory cell MC-S in a state in which the stress voltage Vst is beingsupplied as the operating voltage. The peripheral circuit MCS-CN outputsthe output data corresponding to the voltage of the data line pair ds,/ds. In this manner, the peripheral circuit MCS-CN reads the data fromthe second memory cell MC-S to which the stress voltage Vst is beingsupplied every time the read-enable signal RES changes so as to be atthe high level.

When the test circuit BIST (FIG. 2) performs the self-diagnosis functionthrough the instruction form the monitor control circuit MON-CN (FIG.2), the test circuit BIST supplies the input data DIS in accordance withthe test pattern formed by the pattern generating circuit PTG, to themonitor memory circuit MON-S, and causes the write-enable signal WES tobe at the high level in accordance with the test pattern. At this time,the power source dropping circuit DVC in the stress voltage generatingcircuit STVC (FIG. 2) operates in accordance with the instruction fromthe monitor control circuit MON-CN. As described in FIG. 2, the powersource dropping circuit DVC drops the power source voltage Vd, andoutputs a voltage acquired by the dropping, as the stress voltage Vst.The voltage value of the stress voltage Vst at this time is lower thanthat of the power source voltage Vd, and is a value determined by thelower limit original-performance data stored in the celloriginal-performance storage register MCRG.

To the peripheral circuit NCS-CN and the second memory cell MC-S, thestress voltage Vst having the voltage value determined by the lowerlimit original-performance data is supplied as the operating voltage.That is, the peripheral circuit MCS-CN and the memory cell MC-S operateunder a condition in which the stress voltage Vst having a low voltagevalue is used as a power source voltage.

When the high level write enable signal WES is supplied to theperipheral circuit MCS-CN, the peripheral circuit MCS-CN causes the wordline WS to be at the high level in response to this high-levelwrite-enable signal WES, so that the test pattern is written into thesecond memory cell MC-S as the input data DIS as similar to a case ofthe stress applying function.

After the input data DIS is written into the second memory cell MC-S,the test circuit BIST causes the read-enable signal RES to be at thehigh level. In response to this, the peripheral circuit MCS-CN causesthe word line WS to be at the high level, so that the output data DOSaccording to the voltage of the data line pair ds, /ds is output.

When the degradation of the characteristics of the MOSFET forming thesecond memory cell MC-S does not progress, the degradation of thecharacteristics of the second memory cell MC-S does not progress,either. Therefore, in the self-diagnosis function, data having the samevalue as that of the written input data DIS is output as the output dataDOS.

The test circuit BIST determines whether the output data DOS suppliedfrom the monitor memory MON-S and the previously-written input data DISmatch with each other or not, supplies a result of the determination tothe diagnosis result register MNRG, and stores the result of thedetermination in the diagnosis result register MNRG. The result of thedetermination stored in the diagnosis result register MNRG is output asthe diagnosis result signal TCN-2 to the outside of the semiconductordevice MCU (FIG. 1) through the external terminal TMN (FIG. 1).

When the degradation of the characteristics of the second memory cellMC-S does not progress, the same data as the data DIS written into thesecond memory cell MC-S during the self-diagnosis function is output asthe output data DOS. In this case, since the input data DIS and theoutput data DOS match with each other, data indicating the result isgood is supplied from the test circuit BIST to the diagnosis resultregister MNRG. In this case, a signal indicating that the result is goodis output as the diagnosis result signal TCN-2.

On the other hand, when the degradation of the characteristic of theMOSFET forming the second memory cell progresses, the degradation of thecharacteristics of the second memory cell MC-S also progresses.Therefore, when the word line WS becomes at the high level, the voltageof the data line pair ds, /ds has a voltage value in no relation to thepreviously-written input data DIS. The peripheral circuit MCS-CN outputsdata in accordance with the voltage of the data line pair ds, /ds as theoutput data DOS. Thus, to the test circuit BIST, the output data DOS inno relation to the previously-written input data DIS is supplied.

The output data DOS and the input data DIS are compared with each otherby the test circuit BIST, and the comparison result is determined to bethe unmatching. When the comparison result is determined to be theunmatching, the test circuit BIST supplies the result indicating theunmatching to the diagnosis result register MNRG, and stores the resultin the diagnosis result register MNRG. The result of the determinationstored in the diagnosis result register MNRG is output as the diagnosisresult signal TCN-2 to the outside of the semiconductor device MCU(FIG. 1) through the external terminal TMN (FIG. 1).

Here, the explanation has been made about the case in which the monitormemory circuit MON-S includes one second memory cell MC-S. However, theembodiment is not limited to this. That is, to the monitor memorycircuit MON-S, a memory array MCA having a plurality of second memorycells MC-S arranged in a matrix may be provided as similar to the staticmemory cell SRAM. Also in this case, a word line is provided to each rowand a data line pair is provided to each column in the arrangementformed of the plurality of second memory cells MC-S.

In this case, the peripheral circuit MCS-CN is made so as to receive anaddress signal for assigning one or a plurality of second memory cellsMC-S from the plurality of second memory cells MC-S, so that a word lineand a data line pair are selected in accordance with the address signalas similar to the static memory SRAM. In the stress application, theinput data DIS based on a text pattern is written into the second memorycell MC-S assigned by the address signal, and is read as output dataDIS. Meanwhile, in the self-diagnosis, at least, the data may bewritten/read to/from the second memory cell MC-S assigned by the addresssignal, and the written input data DIS and the read output data DOS maybe compared with each other by the test circuit BIST.

In this case, in the stress application, the test circuit BIST forms theaddress signal to be supplied to and data to be supplied as the inputdata DIS to the monitor memory circuit MON-S in accordance with the testpattern formed by a pattern generating circuit PTG. On the other hand,in the self-diagnosis, the test circuit BIST forms the address signaland the input data DIS to be supplied to the monitor memory circuitMON-S in accordance with the test pattern formed by the patterngenerating circuit PTG so that the writing operation is performed. Afterthat, the test circuit BIST forms an address signal so that the readingoperation is performed. During the reading operation, the test circuitBIST compares the output data DOS read from the monitor memory circuitMON-S and the written input data DIS or the test pattern. A result ofthis comparison is supplied to a diagnosis result register MNRG and thenis stored in the diagnosis result register MNRG. <Circuits ofSemiconductor Device>

Each of FIGS. 4A and 4B is a circuit diagram of a configuration of acircuit forming the circuit block included in the semiconductor deviceMCU according to the first embodiment. FIG. 4A is the circuit diagram ofthe configuration of the static memory cell (a memory cell) illustratedin FIG. 3. FIG. 4B is the circuit diagram of the example of the logiccircuit included in each of the central processing circuit CPU, thestatic memory SRAM, the nonvolatile memory FLASH, the user circuit PEP,and others illustrated in FIG. 1.

Each of the central processing circuit CPU, the static memory SRAM, thevolatile memory FLASH, the user circuit PEP, and others illustrated inFIG. 1, includes the plurality of logic circuits. An inverter circuit isillustrated in FIG. 4B as an example of these logic circuits. Theinverter circuit includes a P-channel MOSFET (hereinafter, referred toas a PMOS) TP1 and an N-channel MOSFET (hereinafter, referred to as anNMOS) TN1. A source of the PMOS TP1 is connected to the power sourcevoltage Vd, and a source of the NMOS TN1 is connected to the groundvoltage Vs. A drain of the PMOS TP1 and a drain of the NMOS TN1 areconnected in common and are connected to an output node O1. A gate ofthe PMOS TP1 and a gate of the NMOS TN1 are connected in common, and areconnected to an input node I1. The inverter circuit formed of the PMOSTP1 and the NMOS TN1 inverts a phase of a signal supplied to the inputnode I1, and outputs the inverted signal from the output node O1.

The NMOS TN1 includes, for example, a pair of N-type semiconductorregions formed apart from each other in the semiconductor substrate, agate oxide film arranged between the pair of N-type semiconductorregions on a main surface of the semiconductor substrate, and a gateelectrode arranged on the gate oxide film. Here, the pair of N-typesemiconductor regions function as a source and a drain, and the gateelectrode functions as a gate. The PMOS TP1 includes a pair of P-typesemiconductor regions formed apart from each other in a well regionformed in the above-described semiconductor substrate, a gate oxide filmarranged on a main surface of the well, and a gate electrode arranged onthe gate oxide film. Also here, the pair of P-type semiconductor regionsfunction as a source and a drain, and the gate electrode functions as agate.

When, for example, a periodic signal is supplied to the input node I1,the NMOS TN1 and the PMOS TP1 are alternately turned ON/OFF. By theoperation for turning the NMOS TN1 and the PMOS TP1 ON/OFF, for example,degradation of characteristics of each of the gate oxide filmsprogresses as time elapses. When the gate oxide films degrade, forexample, threshold voltages of the PMOS TP1 and the NMOS TN1 areshifted.

By the change of the threshold voltages of the PMOS TP1 and the NMOSTN1, a logical threshold voltage of the inverter circuit is changed.That is, the characteristics of the inverter circuit also degrade. Whenthe characteristics of the inverter circuit degrades to change thelogical threshold voltage, for example, an output signal to be outputfrom the output node O1 does not change at an appropriate timing withrespect to the change of the signal supplied to the input node I1.Accordingly, the performance of the semiconductor device MCU is degradedor has a failure.

According to the first embodiment, as described in FIGS. 3A and 3B, thefirst memory cell MC forming the static memory SRAM and the secondmemory cell MC-S forming the monitor memory circuit MON-S have the sameconfiguration as each other, and this circuit configuration isillustrated in FIG. 4A. In FIGS. 4A and 4B, a reference character inparentheses indicates a reference character relating to the secondmemory cell MC-S illustrated in FIG. 3B, and a reference character putin front of the parentheses indicates a reference character relating tothe first memory cells MC illustrated in FIG. 3A.

In FIG. 4A, the memory cell MC (MC-S) includes PMOSs TP2 and TP3 andNMOSs TN2 to TN5.

A source of each of the PMOSs TP2 and TP3 is connected to a power sourcevoltage node N1, and a source of each of the NMOSs TN2 and TN3 isconnected to a ground voltage node N2. A drain of each of the PMOS TP2and the NMOS TN2 is connected to an input/output node /IO in common, anda drain of each of the PMOS TP3 and the NMOS TN3 is connected to aninput/output node IO in common. A gate of each of the PMOS TP2 and theNMOS TN2 is connected to the input/output node IO in common, and a gateof each of the PMOS TP3 and the NMOS TN3 is connected to theinput/output /IO in common.

A first inverter circuit connected between the power source voltage nodeN1 and the ground voltage node N2 can be considered to be configured bythe PMOS TP2 and the NMOS TN2. Similarly, a second inverter circuitconnected between the power source voltage node N1 and the groundvoltage node N2 can be considered to be configured by the PMOS TP3 andthe NMOS TN3. In such consideration, inputs and outputs of a pair ofinverter circuits (the first inverter circuit and the second invertercircuit) are cross-connected, so that a so-called flip-flop circuit canbe considered to be configured. In this case, the first invertercircuit, the second inverter circuit, and the flip-flop circuit operatewhile taking the predetermined voltage to be supplied to the powersource voltage node N1 as an operating voltage.

A source-drain path of the NMOS TN4 is connected between theinput/output node /IO and the data line /d0 (/ds) arranged in the samecolumn as that of this memory cell MC (MC-S), and a gate thereof isconnected to the word line W0 (WS). The word line W0 is a word linearranged in the same row as that of the memory cell MC (MC-S).Similarly, a source-drain path of the NMOS TN5 is connected between theinput/output node IO and the data line d0 (ds) arranged in the samecolumn as that of the memory cell MC (MC-S), and a gate thereof isconnected to the word line W0 (WS). The NMOSs TN4 and TN5 are controlledso as to be turned ON/OFF by the voltage of the word W0 (WS). When theword line W0 (WS) is at the high level, they are turned ON so that theinput/output nodes IO, /IO and the data lines d0 (ds), /d0 (/ds) areelectrically connected to each other. The data line pair d0 (ds), /d0(/ds) and the input/output nodes IO, /IO are electrically connected toeach other by supplying the high level to the word line W0 (WS) in astate in which the predetermined voltage is supplied to the power sourcevoltage node N1. Thus, in data writing, a complementary voltage inaccordance with the data to be written is supplied to the data line paird0 (ds), /d0 (/ds), so that this complementary voltage is transmitted tothe input/output nodes IO and /IO of the flip-flop circuit, and theflip-flop circuit is set in a state in accordance with the data. Thatis, the data is written in the memory cell MC (MC-S). The word line W0(WS) is made so as to be at the low level so that the NMOSs TN4 and TN5are turned OFF, so that the flip-flop circuit retains the state. On theother hand, the high level is supplied to the word line W0 (WS) and thenthe voltage of the data line pair d0 (ds), /d0 (ds) is detected, so thata voltage in accordance with a state of the flip-flop circuit at thattime can be obtained. That is, the data stored (saved) in the memorycell MC (MC-S) can be read.

According to the first embodiment, the power source voltage Vd issupplied to the power source voltage node N1 of each of the first memorycells MC (the plurality of memory cells MC) included in the staticmemory SRAM as the predetermined voltage. Note that the ground voltageVs is supplied to the ground voltage node N2.

On the other hand, to a power source voltage node N1 of the secondmemory cell MC-S included in the monitor memory circuit MON-S, thestress voltage Vst having a voltage value higher than that of the powersource voltage Vd is supplied as the predetermined voltage during aperiod in which the stress applying function operates in the testcircuit BIST. During a period in which the self-diagnosis functionoperates in the test circuit BIST, the stress voltage Vst having avoltage value which is lower than that of the power source voltage Vdand which is determined by the lower limit original-performance valuestored in the cell original-performance storage register MCRG issupplied to the power source voltage node N1 of the second memory cellMC-S as the predetermined voltage.

Note that the ground voltage Vs is supplied to a ground voltage node N2of the second memory cell MC-S included in the monitor memory circuitMON-S regardless of the voltage value of the stress voltage Vst to besupplied to the power source voltage node N1 although not particularlylimited thereto. In the present specification, the power source voltagenode N1 in the first memory cell MC is referred to as a first voltagenode, the power source voltage node N1 in the second memory cell MC-S isreferred to as a second voltage node, and the ground voltage node N2 inthe memory cell is referred to as reference voltage node in some cases.

To the peripheral circuit MC-CN included in the static memory SRAM, thepower source voltage Vd is supplied as the operating voltage. Therefore,the peripheral circuit MC-CN causes the power source voltage Vd to be atthe high level to be supplied to the word lines W0 to Wn, although notparticularly limited to this. That is, in the static memory SRAM, thehigh level to be supplied to the word lines is the power source voltageVd.

When the data is written in the first memory cell MC, the peripheralcircuit MC-CN supplies the power source voltage Vd to the data line d0(or /d0) and supplies the ground voltage Vs to the data line /d0 (or d0)in accordance with the data to be written. On the other hand, when thedata is read from the first memory cell MC, the data lines d0, /d0change between the power source voltage Vd and the ground voltage Vs inaccordance with the data to be read.

Meanwhile, to the peripheral circuit MCS-CN included in the monitormemory circuit MON-S, the stress voltage Vst is supplied as theoperating voltage. Therefore, when the stress applying function operatesin the test circuit BIST, the high level to be supplied to the word lineWS becomes the stress voltage Vst having a voltage value higher thanthat of the power source voltage Vd formed by the power source boostingcircuit UVC, although not particularly limited to this. On the otherhand, when the self-diagnosis function operates in the test circuitBIST, the high level to be supplied to the word line WS becomes thestress voltage Vst having a voltage value, lower than that of the powersource voltage Vd formed by the power source dropping circuit DVC.

During a period in which the stress applying function operates, when thedata is written in the second memory cell MC-S, the peripheral circuitMCS-CN supplies the stress voltage Vst to the data line d0 (or /d0) andsupplies the ground voltage Vs to the data line /d0 (or d0) inaccordance with the data to be written. The stress voltage Vst at thistime has a voltage value higher than that of the power source voltageVd. On the other hand, during a period in which the self-diagnosisfunction operates, when the data is written in the second memory cellMC-S, the peripheral circuit MCS-CN supplies the stress voltage Vs tothe data line d0 (or /d0) and supplies the ground voltage Vs to the dataline /d0 (or d0) in accordance with the data to be written. The stressvoltage Vst at this time has a voltage value lower than that of thepower source voltage Vd.

Each of the PMOSs TP2 and TP3 and the NMOSs TN2 to TN5 included in thememory cell MC (MC-S) has the same configuration as that of each of thePMOS TP1 and the NMOS TN1 illustrated in FIG. 4B. That is, each of theNMOSs TN2 to TN5 has a pair of N-type semiconductor regions formed inthe semiconductor substrate on which the NMOS TN1 is formed, a gateinsulating film formed between the pair of N-type semiconductor regionson the main surface of the semiconductor substrate, and a gate electrodeformed on the gate insulating film. Similarly, each of the PMOS TP2 andTP3 has a pair of P-type semiconductor regions formed in a well formedin the semiconductor substrate on which the NMOS TN1 is formed, a gateinsulating film formed between the pair of P-type semiconductor regionson a main surface of the well, and a gate electrode formed on the gateinsulating film.

Therefore, the NMOS TN1 included in the logic circuit, the NMOSs TN2 toTN5 included in the first memory cell MC, and the NMOSs TN2 to TN5included in the second memory cell MC-S have similar characteristics toone another. Similarly, the PMOS TP1 included in the logic circuit, thePMOSs TP2 and TP3 included in the first memory cell MC, and the PMOSsTP2 and TP3 included in the second memory cell MC-S also have similarcharacteristics to one another.

Accordingly, the writing operation and the reading operation areperformed to the second memory cell MC-S in a state in which the stressvoltage Vst having a voltage value higher than that of the power sourcevoltage Vd is supplied to the second memory cell MC-S, so that thedegradation of the characteristics of the MOSFETs (the PMOSs and theNMOSs) caused when the logic circuit and the first memory cell MC haveoperated at the power source voltage Vd for a long time can be simulatedfor a short time.

According to the first embodiment, to the memory cell MC-S, the stressvoltage Vst as a voltage lower than the power source voltage Vd andcorresponding to the lower limit original-performance value is supplied.Accordingly, failures can be predicted at a timing earlier than a timingof occurrence of the failures of the logic circuit and the first memorycell MC.

<Operation of Semiconductor Device>

FIG. 5 is a flowchart of operation of the semiconductor device MCUaccording to the first embodiment. The monitor circuit MON illustratedin FIG. 1 operates temporally in parallel to other circuit blocksembedded in the semiconductor device MCU. As the other circuit blocksdescribed here, the central processing circuit CPU, the static memorySRAM, the user circuit PEP and others illustrated in FIG. 1 except forthe monitor circuit MON are cited.

These other circuit blocks operate in accordance with a flowchart SNillustrated on the left side of a dot-and-dash line in FIG. 5, and themonitor circuit MON operates in accordance with a flowchart SSillustrated on the right side of the dot-and-dash line. The flowchart SNincludes steps SN0 to SN4 described below, and the flowchart SS includessteps SS0 to SS6 described below.

In the semiconductor device MCU provided from the semiconductormanufacturer to the user, in order to achieve a function of thesemiconductor device MCU, the user supplies the power source voltage Vdand the ground voltage Vs from a power source device (a power sourcedevice for the semiconductor device) provided on the outside of thesemiconductor device MCU, to the external terminals (the power sourceterminals) TVd and TVs illustrated in FIG. 1. This corresponds to stepSN0 (of turning the semiconductor device ON) in FIG. 5. To thesemiconductor device MCU, the power source voltage Vd and the groundvoltage Vs are supplied, so that the semiconductor device MCU operatesat step SN1 (the operation start in FIG. 5). When the operation starts,the control circuit CNT illustrated in FIG. 2 generates the triggersignal Tg (asserts the trigger signal Tg) so as to activate the monitorcircuit MON-CN.

Meanwhile, the central processing circuit CPU, the nonvolatile memoryFLASH, the static memory, the user circuit PEP, and others, which arethe other circuit blocks, start to operate at step SN1, and operate soas to achieve the function desired by the user at step SN2. At step SN2,in order to achieve the function desired by the user, the other circuitblocks continuously operate. Therefore, in FIG. 5, a wording “duringoperation” is described in step SN2.

When the function desired by the user is achieved, the other circuitblocks end the operation at step SN3. At this time, the control circuitCNT generates the trigger signal Tg (negates the trigger signal Tg) soas to stop the monitor circuit MON-CN. After that, the user stopssupplying the power source voltage Vd and the ground voltage Vs to theexternal terminals TVd and TVs at step SN4 (of turning the semiconductordevice OFF in FIG. 5).

In this manner, according to the first embodiment, in order to achievethe function desired by the user, the trigger signal Tg is asserted insynchronization with a timing of the start of the operations of theother circuit blocks, and then, the trigger signal Tg is negated whenthe desired function is achieved.

The trigger signal Tg is asserted, so that the monitor circuit MONstarts the operation in parallel to the operations of the other circuitblocks to perform steps SS0 to SS5 are performed. The trigger signal Tgis negated, so that the monitor circuit MON stops the operation. Thatis, when the power source voltage Vd is supplied to the semiconductordevice MCU, the other circuit blocks operate, and the monitor circuitMON also operates in parallel to this operation.

First, when the trigger signal Tg is asserted, the monitor controlcircuit MON-CN (FIG. 2) starts the operation. When the operation starts,the monitor control circuit MON-CN starts operation of the timer circuitTMC (step SS0).

According to the first embodiment, two pieces of stress time data TIM-Aand TIM-B are stored as the stress application time to be stored in thestress time register STRG (FIG. 2). The semiconductor manufacturerpreviously stores the two pieces of stress time data TIM-A and TIM-B inthe stress time register STRG. Here, the stress time data TIM-A is datafor determining a period of time from the assertion of the triggersignal Tg to the start of the stress application, and the stress timedata TIM-B is data for determining a period of time during the stressapplication.

By the two pieces of stress time data TIM-A and TIM-B, the start time ofthe stress application and the time during the stress application can bedetermined. It is assumed that a period of time in which the power issupplied to the semiconductor device MCU to operate the semiconductordevice MCU is defined as 100%, and that a period of time in which theother circuit blocks (the SRAM, the CPU and others) operate is definedas, for example, a half period (50%) of the period (100%) in which thesemiconductor device MCU operates. According to the first embodiment,the pieces of stress time data TIM-A and TIM-B are set so that thestress is applied to the monitor memory circuit MON-S during the halfperiod (50%) of this period, namely, during the same period as theperiod (50%) in which the other circuit blocks operate based on theperiod (100%) in which the power is supplied to the semiconductor deviceMCU. Needless to say, the period of the stress application can beappropriately set by changing the pieces of stress time data TIM-A andTIM-B, although not limited to the period of 50%.

At step SS1, the monitor control circuit MON-CN compares the period oftime indicated by the stress time data TIM-A stored in the stress timeregister STRG and measurement time (Timer) measured by the timer circuitTMC. Step SS1 repeats until the measurement time (Timer) reaches theperiod of time indicated by the stress time data TIM-A. That is, onlythe time measurement by the timer circuit TMC is performed. During thisperiod, the reading operation and the writing operation are notperformed to the second memory cell MC-S in the monitor memory circuitMON-S.

On the other hand, when the measurement time reaches the period of timeindicated by the stress time data TIM-A (Yes), the monitor controlcircuit MON-CN performs step SS2 next.

That is, the monitor control circuit MON-CN operates the power sourceboosting circuit UVC by using the voltage control signal Vcnt, operatesthe pattern generating circuit PTG by using the test pattern controlsignal Pcnt, and operates the stress applying function in the testcircuit BIST by using the test control signal Tcnt. Accordingly, to themonitor memory circuit MON-S, the stress voltage Vst having a voltagevalue higher than that of the power source voltage Vd is supplied as theoperating voltage, and the input data DIS (FIG. 3) and the write-enablesignal WES (FIG. 3) in accordance with the test pattern formed by thepattern generating circuit PTG are supplied, so that the input data DISis written in the monitor memory circuit MON-S. In accordance with thetest pattern, the read-enable signal RES (FIG. 3) is supplied to themonitor memory circuit MON-S, and the output data DOS is read from themonitor memory circuit MON-S. As a result, the writing operation and thereading operation are performed to the second memory cell MC-S in themonitor memory circuit MON-S in a state in which the stress voltage Vsthaving a voltage value higher than that of the power source voltage Vdis supplied, so that the stress is applied to the second memory cellMC-S.

Following step SS2, the monitor control circuit MON-CN performs stepSS3. The monitor control circuit MON-CN compares the period of timeindicated by the stress time data TIM-B stored in the stress timeregister STRG and measurement time (Timer) measured by the timer circuitTMC. Steps SS2 and SS3 repeat until the measurement time (Timer) reachesthe period of time indicated by the stress time data TIM-B. That is,until the measurement time reaches the period of time indicated by thestress time data TIM-B, the writing operation and the reading operationare performed to the second memory cell MC-S in a state in which thestress voltage Vst having a voltage value higher than that of the powersource voltage Vd is supplied, so that the stress is continuouslyapplied.

On the other hand, when the measurement time reaches the period of timeindicated by the stress time data TIM-B (Yes), the monitor controlcircuit MON-CN performs step SS4 next.

At step SS4, the monitor control circuit operates the power sourcedropping circuit DVC by using the voltage control signal Vcnt, operatesthe pattern generating circuit PTG by using the test pattern controlsignal Pcnt, and operates the self-diagnosis function in the testcircuit BIST by using the test control signal Tcnt. Accordingly, to themonitor memory circuit MON-S, the stress voltage Vst having a voltagevalue lower than that of the power source voltage Vd is supplied as theoperating voltage. At this time, from the test circuit BIST, thewrite-enable signal WES (FIG. 3) is supplied to the monitor memorycircuit MON-S. As a result, the writing operation is performed to thesecond memory cell MC-S in the monitor memory circuit MON-S in a statein which the stress voltage Vst having a voltage value lower than thatof the power source voltage Vd is supplied. After that, from the testcircuit BIST, the read-enable signal RES (FIG. 3) is supplied to themonitor memory circuit MON-S. As a result, the reading operation isperformed to the second memory cell MC-S in the monitor memory circuitMON-S in a state in which the stress voltage Vst having a voltage valuelower than that of the power source voltage Vd is supplied. The readdata is supplied to the test circuit BIST as the output data DOS (FIG.3), and is compared with the previously written input data DIS. A resultof the comparison is stored in the diagnosis result register MNRG in themonitor control circuit MON-CN.

At step SS5, the monitor control circuit MON-CN determines the resultstored in the diagnosis result register MNRG. When a result of thedetermination passes (OK), the timer circuit TMC is reset and then stepSS1 is performed. When the result of the determination fails (NG), thediagnosis result signal TCN-2 notifies the outside of the semiconductordevice MCU of the fail.

When the result of the determination passes, the above-described stepsSS1 to SS5 are repeatedly performed. Therefore, the stress applicationand the self-diagnosis are repeated with a cycle having the period oftime indicated by the stress time data TIM-A. In each cycle, the periodof time of the stress application is assigned by the stress time dataTIM-B. Accordingly, the stress can be applied and the self-diagnosis canbe performed during an appropriate period of time during the period inwhich the other circuit blocks operate.

When the trigger signal Tg is negated, the monitor control circuitMON-CN stops the operation at step SS6. At this time, the timer circuitTMC also stops the operation. That is, when the result of thedetermination passes at step SS5, the stress application and theself-diagnosis are repeated in predetermined cycles (the pieces ofstress time data TIM-A+TIM-B) until the operation of the semiconductordevice MCU ends.

Note that the control circuit CNT (FIGS. 1 and 2) has a so-called JTAGfunction. By using the JTAG function, the semiconductor manufacturerstores the pieces of stress time data TIM-A and TIM-B and the lowerlimit original-performance value (the lower limit original-performancedata) in the stress time register STRG and the cell original-performancestorage register MCRG before the semiconductor device MCU is shippedfrom the semiconductor manufacturer, such as in the test process.Therefore, the user does not need to be aware of the storage of thepieces of stress time data TIM-A and TIM-B and the lower limitoriginal-performance data or others into the registers.

<Operation of Self-Diagnosis>

FIG. 6 is a flowchart for describing the step SS4 illustrated in FIG. 5in detail. In FIG. 6, steps surrounded with a broken line indicate stepsperformed by the test circuit BIST illustrated in FIG. 2 as theself-diagnosis function.

First, at step SP0, the process starts. Next, at step SP1, the monitorcontrol circuit MON-CN reads the lower limit original-performance data,which is the cell original-performance data, from the celloriginal-performance storage register MCRG. As described above, thesemiconductor manufacturer previously acquires this lower limitoriginal-performance data, and stores it in the celloriginal-performance storage register MCRG.

Next, in the power source dropping circuit DVC, the monitor controlcircuit MON-CN determines the voltage value of the stress voltage Vst tobe formed from the power source voltage Vd based on the read lower limitoriginal-performance data. Here, in consideration of an allowable marginfor the degradation of the characteristics of the MOSFET or others, aslightly-moderated voltage value is determined as the stress voltageVst. Needless to say, the voltage value of the stress voltage Vst is avalue under a condition which is severer than a standard range of thesemiconductor device MCU.

Next, at step SP3, the monitor control circuit MON-CN generates the testpattern control signal Pcnt, and generates the test pattern in thepattern generating circuit PTG. The test pattern is supplied to the testcircuit BIST. The test circuit BIST supplies and writes the data basedon the supplied test pattern, to and in the monitor memory circuit MON-Sat step SP4. Next, at step SP5, the test circuit BIST reads the datafrom the monitor memory circuit MON-S. After that, at step SP6, the testcircuit BIST compares the data written at step SP4 and the data read atstep SP5 so as to determine that the result either passes or fails. Inaccordance with a result of the determination at step SP6, a step to beperformed next is determined at step SP7. That is, when the resultpasses (OK), the process returns to step SS1 described in FIG. 5. Whenthe result fails (NG), the diagnosis result is stored in the diagnosisresult register MNRG. At SP6, note that the data read at step SP5 andthe test pattern generated at step SP3 may be compared with each other.

FIG. 12 is a characteristic diagram illustrating a lower limit operatingvoltage at which the MOSFET is operable. In FIG. 12, a horizontal axisrepresents time, and a vertical axis represents a shift amount of thelower limit voltage. In the drawing, a solid line indicates change(temporal change) of the lower limit operating voltage shift amount withrespect to the elapsed time when the reference (Typ) operating voltageVd is applied to the MOSFET. A broken line indicates temporal change ofthe lower limit operating voltage shift amount caused when a voltagehigher than the reference operating voltage by 10% is applied to theMOSFET as the operating voltage Vd, and a dot-and-dash line indicatestemporal change of the lower limit operating voltage shift amount causedwhen a voltage higher than the reference operating voltage by 20% isapplied to the MOSFET as the operating voltage Vd.

From FIG. 12, it can be understood that the lower limit operatingvoltage shift amount of the MOSFET, namely, the characteristics thereofdegrade as the time elapses. Also, it can be understood that thedegradation is increased by the increase in the operating voltage.

FIG. 13 is a characteristic diagram illustrating bathtub curves of thesemiconductor device. The semiconductor device typically has a 10-yearwarranty. Therefore, in the bathtub curves illustrated in FIG. 13, it isrequired in reliability evaluation of the semiconductor device to verifythat a period until start of a wear-out failure (a product life) is 10years or more. As illustrated in FIG. 12, the degradation of thecharacteristics of the MOSFET can be increased by the increase in theoperating voltage. In other words, the degradation of thecharacteristics of the MOSFET can be accelerated in terms of time by theincrease in the operating voltage.

According to the first embodiment, the operating voltage to be suppliedto the second memory cell MC-S in the monitor memory circuit MON-S isused as the stress voltage Vst having a voltage value higher than thatof the power source voltage Vd to be supplied to the other circuitblocks as the operating voltages. Therefore, degradation of the secondmemory cell MC-S is more accelerated than the other circuit blocks. Inthe bathtub curves illustrated in FIG. 13, a solid line (A) indicates abathtub curve obtained when the other circuit blocks operate at theoperating voltage Vd, and a broken line (B) indicates a bathtub curveobtained when the acceleration stress is applied to the second memorycell MC-S as described in the first embodiment. In the bathtub curvewith the broken line (B), the wear-out failure occurring on the rightside shifts to the left side. That is, a timing at which the wear-outfailure occurs in the second memory cell MC-S can be set so as to beearlier than those of the other circuit blocks. As a result, bymonitoring a state of the second memory cell MC-S, the wear-out failurecan be detected before the wear-out failures occur in the other circuitblocks.

In this manner, according to the first embodiment, the semiconductordevice MCU suitable for predicting the failure can be provided.

The semiconductor device is sometimes used for 10 years or moredepending on purposes. Also in this case, the failure can be previouslypredicted before the semiconductor device breaks down due to thetemporal degradation. Thus, the user can use the semiconductor devicewithout any concern. Even if the wear-out failure occurs less than 10years, the failure can be predicted before the failure occurs.Therefore, the manufacturer can collect and fix the semiconductor deviceat an early stage at which the failure is predicted.

According to the first embodiment, FIGS. 5 and 6 can be also consideredto illustrate a method of diagnosing the semiconductor device. In FIG.5, step SN2 can be considered to illustrate an operating process whichoperates the semiconductor device MCU including the storage circuit (thestatic memory SRAM) having the plurality of first static memory cellsMC, and the logic circuit (such as the central processing circuit CPU).The test process exists in parallel to the operating process in terms oftime. In FIG. 5, the test process includes steps SS1 to SSS. In the testprocess, the stress is applied to the second static memory cell MC-S. Inthe test process, the stress is applied to the second static memory cellMC-S during the period (a first period) determined by the stress timedata TIM-B. After that, the second static memory cell is diagnosed atstep SS4 (in a diagnosis process).

(Second Embodiment)

FIG. 7 is a block diagram of a configuration of a semiconductor deviceMCU according to a second embodiment. Since FIG. 7 is similar to FIG. 2,only differences will be mainly described here. In FIG. 2, the stressvoltage generating circuit STVC having the power source boosting circuitUVC and the power source dropping circuit DVC is provided in the monitorcircuit MON. On the other hand, according to the second embodiment,instead of the stress voltage generating circuit STVC, a power sourcedropping circuit DVC2 is provided in a monitor circuit MON.

When a voltage control signal Vcnt instructs the operation of the powersource boosting circuit UVC illustrated in FIG. 2, the power sourcedropping circuit DVC2 outputs and supplies a voltage having the samevoltage value as that of a power source voltage Vd to a monitor memorycircuit MON-S as a stress voltage Vst.

On the other hand, when the voltage control signal Vcnt instructs theoperation of the power source dropping circuit UVC illustrated in FIG.2, the power source dropping circuit DVC2 supplies a voltage having avoltage value lower than that of the power source voltage Vd to themonitor memory circuit MON-S as the stress voltage Vst as similar to thepower source dropping circuit UVC descried in the first embodiment. Thevoltage value of the stress voltage Vst at this time is determined inaccordance with the lower limit original-performance data stored in acell original-performance storage register MCRG as similar to the firstembodiment.

Accordingly, when a stress applying function operates in a test circuitBIST, the monitor memory circuit MON-S operates by using the stressvoltage Vst having the same voltage value as that of the power sourcevoltage Vd as a power source voltage. On the other hand, aself-diagnosis function operates in the test circuit BIST, the monitormemory circuit MON-S operates by using the stress voltage Vst having avoltage value lower than that of the power source voltage Vd as theoperating voltage as similar to the first embodiment.

Therefore, an operating voltage obtained when the stress is applied to asecond memory cell MC-S in the monitor memory circuit MON-S is the sameas, for example, that of the first memory cell MC in a static memorySRAM such as other circuit blocks. However, in the self-diagnosis, thestress voltage Vst having a voltage value lower than that of the powersource voltage Vd is supplied to the second memory cell MC-S as theoperating voltage. Accordingly, the degradation of the characteristicscan be detected earlier than the other circuit blocks because of theself-diagnosis with the low voltage at which the degradation of thecharacteristics remarkably appears, so that the failure can be predictedas similar to the first embodiment.

Also according to the second embodiment, when a period in which thesemiconductor device MCU operates, namely, a period in which the powersource voltage Vd is supplied, is defined as 100%, the ratio of a periodin which the stress is applied to the second memory cell MC-S can beappropriately changed by using the stress application time to be set ina stress time register STRG. According to the first embodiment, theratio of the period in which the stress is applied to the second memorycell is set to be 50% so as to match with the ratio (50%) with which theother circuit blocks operate. According to the second embodiment, thestress voltage Vst in the stress application is lower than that of thefirst embodiment, and therefore, the ratio is desirably set to be higherthan 50%. Accordingly, the stress to be applied to the second memorycell MC-S can be made larger than those of the other circuit blocks.

According to the second embodiment, it is not required to provide thepower source boosting circuit UVC to the monitor circuit MON. Thus, thecircuit scale of the monitor circuit MON can be reduced, and the cost ofthe semiconductor device MCU can be reduced.

(Third Embodiment)

FIG. 8 is a block diagram of a configuration of a semiconductor deviceMCU according to a third embodiment. Since FIG. 8 is similar to FIG. 2,only differences will be mainly described. In FIG. 2, the stress voltagegenerating circuit STVC having the power source boosting circuit UVC andthe power source dropping circuit DVC is provided to the monitor circuitMON. On the other hand, according to the third embodiment, instead ofthe stress voltage generating circuit STVC, a power source boostingcircuit UVC2 is provided to a monitor circuit MON.

When a voltage control signal Vcnt instructs the operation of the powersource dropping circuit DVC illustrated in FIG. 2, the power sourceboosting circuit UVC2 outputs and supplies a voltage having the samevoltage value as that of a power source voltage Vd, to a monitor memorycircuit MON-S as a stress voltage Vst.

On the other hand, when the voltage control signal Vcnt instructs theoperation of the power source boosting circuit UVC illustrated in FIG.2, the power source boosting circuit UVC2 supplies a voltage having avoltage value higher than that of the power source voltage Vd to themonitor memory circuit MON-S as the stress voltage Vst as similar to thepower source boosting circuit UVC described in the first embodiment.

Accordingly, when a stress applying function operates in a test circuitBIST, the monitor memory circuit MON-S operates while using the stressvoltage Vst having a voltage value higher than that of the power sourcevoltage Vd as a power source voltage as similar to the first embodiment.On the other hand, when a self-diagnosis function operates in the testcircuit BIST, the monitor memory circuit MON-S operates while using thestress voltage Vst having the same voltage value as that of the powersource voltage Vd as an operating voltage.

Therefore, an operating voltage used when stress is applied to a secondmemory cell MC-S in the monitor memory circuit MON-S is made to behigher than, for example, an operating voltage of the first memory cellsMC in other circuit blocks such as a static memory SRAM. On the otherhand, in the self-diagnosis, the stress voltage Vst having the samevoltage value as that of the power source voltage Vd is supplied to thesecond memory cell MC-S as the operating voltage. Accordingly, thestress to be applied to the second memory cell MC-S can be made to belarger than those of the other circuit blocks (for example, the firstmemory cells MC). As a result, degradation of characteristics in thesecond memory cell MC-S can be caused to be earlier than degradation ofcharacteristics in the other circuit blocks. Thus, a failure can bepredicted as similar to the first embodiment.

In the third embodiment, based on stress application time to be set in astress time register STRG, the ratio of a period in which the stress isapplied to the second memory cell MC-S can be also appropriately changedwith respect to the ratio (50%) with which the other circuit blocksoperate. A stronger stress may be applied to the second memory cell MC-Sby changing the stress application time so that the ratio with which thesecond memory cell MC-S operates is higher than 50%.

According to the third embodiment, it is not required to provide thepower source dropping circuit DVC in the monitor circuit MON. Thus, thecircuit scale of the monitor circuit MON can be reduced, so that thecost of the semiconductor device MCU can be reduced.

(Fourth Embodiment)

FIG. 9 is a block diagram of a configuration of a semiconductor deviceMCU according to a fourth embodiment. Since FIG. 9 is similar to FIG. 2,differences will be mainly described. In FIG. 2, the stress voltagegenerating circuit STVC is provided in the monitor circuit MON. On theother hand, according to the fourth embodiment, instead of the stressvoltage generating circuit STVC, a power source applying circuit STVC2is provided in a monitor circuit MON.

When a voltage control signal Vcnt instructs the operation of the powersource dropping circuit DVC and the operation of the power sourceboosting circuit UVC illustrated in FIG. 2, the power source applyingcircuit STVC2 supplies a voltage having the same voltage value as thatof a power source voltage Vd, to a monitor memory circuit MON-S as astress voltage Vst.

Accordingly, when a stress applying function and a self-diagnosisfunction operates in a test circuit BIST, the monitor memory circuitMON-S operates while using the stress voltage Vst having the samevoltage value as that of the power source voltage Vd as an operatingvoltage.

According to the fourth embodiment, based on stress application time tobe set in a stress time register STRG, the ratio of a period in whichthe stress applying function operates in the test circuit BIST, namely,the ratio of a period in which stress is applied to the second memorycell MC-S, is set to be higher than 50% with respect to a ratio (50%)with which other circuit blocks operate. As a result, a period in whichthe second memory circuit MC-S operates is lengthened, so that thestress to be applied to the second memory cell MC-S can increase. By theincrease in the stress, degradation of the second memory cell MC-S canbe caused earlier. Thus, a failure can be predicted as similar to thefirst embodiment.

According to the fourth embodiment, the monitor circuit MON includes nopower source boosting circuit UVC and no power source dropping circuitDVC. Thus, the circuit scale of the monitor circuit MON can be reduced,so that the cost of the semiconductor device MCU can be reduced.

FIGS. 10A, 10B, 11A and 11B are diagrams for describing the voltages tobe supplied to the monitor memory circuit MON-S in the first embodimentto the fourth embodiment. Since the voltage to be supplied to themonitor memory circuit MON-S becomes the operating voltage of the secondmemory cell MC-S in the monitor memory circuit MON-S, FIGS. 10A, 10B,11A, and 11B can be considered to illustrate the operating voltage to besupplied to the second memory cell MC-S. In FIGS. 10A, 10B, 11A, and11B, the power source voltage Vd to be supplied to the other circuitblocks as the operating voltage is illustrated with a broken line as areference. A vertical axis indicates the voltage in these drawings.

FIG. 10A illustrates the stress voltage Vst to be supplied to themonitor memory circuit MON-S in the first embodiment. In FIG. 10A, areference character “Vst(ST)” indicates a stress voltage formed byboosting the power source voltage Vd (the broken line) by the powersource boosting circuit UVC illustrated in FIG. 2. Also, the Vst (TS)indicates a stress voltage formed by dropping the power source voltageVd (the broken line) by the power source dropping circuit DVCillustrated in FIG. 2. When the stress applying function operates, thestress voltage Vst(ST) is supplied to the monitor memory circuit MON-S.When the self-diagnosis function operates, the stress voltage Vst(TS) issupplied to the monitor memory circuit MON-S. FIG. 10B illustrates thestress voltage Vst to be supplied to the monitor memory circuit MON-S inthe second embodiment. In FIG. 10B, a reference character “Vst(TS)”indicates a stress voltage formed by dripping the power source voltageVd (the broken line) by the power source dropping circuit DVC2illustrated in FIG. 7. As described in the second embodiment, when thestress applying function operates, the power source dropping circuitDVC2 supplies the stress voltage Vst(ST) having the same voltage valueas that of the power source voltage Vd, to the monitor memory circuitMON-S. On the other hand, when the self-diagnosis function operates, thepower source dropping circuit DVC2 supplies the formed stress voltageVst(TS) to the monitor memory circuit MON-S.

FIG. 11A illustrates the stress voltage Vst to be supplied to themonitor memory circuit MON-S in the third embodiment. In FIG. 11A, areference character “Vst(ST) ” indicates a stress voltage formed byboosting the power source voltage Vd (the broken line) by the powersource boosting circuit UVC2 illustrated in FIG. 8. When the stressapplying function operates, the stress voltage Vst(ST) is supplied tothe monitor memory circuit MON-S. On the other hand, when theself-diagnosis operates, the power source boosting circuit UVC2 suppliesthe stress voltage Vst(TS) having the same voltage value as that of thepower source voltage Vd, to the monitor memory circuit MON-S.

FIG. 11B illustrates the stress voltage Vst to be supplied to themonitor memory circuit MON-S in the fourth embodiment. In FIG. 11B, areference character “Vst(ST) ” indicates a stress voltage to be suppliedto the monitor memory circuit MON-S when the stress applying function isoperated by the power source applying circuit STVC2 illustrated in FIG.9. Also, a reference character “Vst(TS)” indicates a stress voltage tobe supplied to the monitor memory circuit MON-S by the power sourceapplying circuit STVC2 when the self-diagnosis operates. As illustratedin FIGS. 10A, 10B, 11A, and 11B, in the first embodiment, the stressvoltage Vst(ST) having a voltage value higher than that of the powersource voltage Vd and the stress voltage Vst(TS) having a voltage valuelower than that of the power source voltage Vd are formed by the stressvoltage generating circuit STVC, and then are supplied to the monitormemory circuit MON-S.

According to the second embodiment, the stress voltage Vst(TS) having avoltage value lower than that of the power source voltage Vd is formedby the power source dropping circuit DVC2. According to the thirdembodiment, the stress voltage Vst(ST) having a voltage value higherthan that of the power source voltage Vd is formed by the power sourceboosting circuit UVC2. In the second and third embodiments, the powersource voltage Vd can be applied as the stress voltage Vst(ST) or thestress voltage Vst(TS). Furthermore, according to the fourth embodiment,the power source voltage Vd can be applied as the stress voltage Vst(TS)and the stress voltage Vst(ST).

The first embodiment has described an example in which the readingoperation and the writing operation are performed to the second memorycell MC-S during the stress application. However, the embodiment is notlimited to this. For example, only the reading operation or only thewriting operation may be repeatedly performed to the second memory cellMC-S during the stress application.

In the first to fourth embodiments, by the pieces of stress time dataTIM-A and TIM-B to be set in the stress time register STRG, a period inwhich the stress is applied to the second memory cell MC-S is set withrespect to a period in which the semiconductor device MCU operates,namely, a period in which the power source voltage Vd is supplied to thesemiconductor device MCU. For example, when the static memory SRAM isconsidered, the stress is applied by the reading or writing operation tothe first memory cell MC while using the power source voltage Vd as theoperating voltage. Thus, a period in which the static memory SRAMoperates (a period in which the reading or the writing is performed)with respect to the period in which the semiconductor device MCUoperates can be considered to be a frequency (ratio) with which stressis applied to the first memory cell MC. Similarly, a period in whichother circuit blocks such as the central processing circuit CPU operatecan also be considered to be a frequency (ratio) with which stress isapplied. These frequencies of the stress application are determined bythe stress application time (the time of the stress).

In the monitor circuit MON, a period in which the stress applyingfunction operates in the test circuit BIST can be also considered to bea frequency (ratio) with which stress is applied to the second memorycell MC-S.

In such consideration, according to the first embodiment, the frequencyof the stress application to the second memory cell MC-S is the same asthose of the other circuit blocks (for example, the SRAM, the CPU, andthe PEP). On the other hand, according to the second and thirdembodiments, the frequency of the stress application to the secondmemory MC-S is desirably set to be higher than those of the othercircuit blocks. According to the fourth embodiment, the frequency of thestress application to the second memory MC-S is set to be higher thanthose of the other circuit blocks.

In the foregoing, the invention made by the present inventors has beenconcretely described based on the embodiments. However, it is needlessto say that the present invention is not limited to the foregoingembodiments and various modifications and alterations can be made withinthe scope of the present invention.

What is claimed is:
 1. A semiconductor device comprising: a logiccircuit; a memory circuit including a plurality of first static memorycells formed by a transistor on the semiconductor substrate; a monitorcircuit including a second static memory cell formed by a transistor onthe semiconductor substrate, the monitor circuit being configured toapply stress to the second static memory cell during a period in whichthe semiconductor device operates so that a state of the second staticmemory cell can be notified; and a bus coupled with the logic circuit,the memory circuit and the monitor circuit, wherein a size of thetransistor of one cell of the first static memory cells is substantivelythe same as that of the transistor of the second static memory cell,wherein, by the monitor circuit, a frequency of the stress applied tothe second static memory cell is set to be higher than a frequency ofstress applied to the storage circuit and the logic circuit during theperiod in which the semiconductor device operates.
 2. The semiconductordevice according to claim 1, wherein each of the plurality of firststatic memory cells includes a pair of inverter circuits which areconnected between a first voltage node and a reference voltage node, andwhose inputs and outputs are cross-connected to each other, and thesecond static memory cell includes a pair of inverter circuits which areconnected between a second voltage node and a reference voltage node,and whose inputs and outputs are cross-connected to each other.
 3. Thesemiconductor device according to claim 2, wherein the stress is appliedby supplying a first voltage to the first voltage node and by supplyinga second voltage having a voltage value different from a voltage valueof the first voltage, to the second voltage node, during the period inwhich the semiconductor device operates.
 4. The semiconductor deviceaccording to claim 3, wherein the second voltage has a voltage valuehigher than the voltage value of the first voltage when the stress isapplied to the second static memory cell.
 5. The semiconductor deviceaccording to claim 4, wherein the second voltage has a voltage valuelower than the voltage value of the first voltage when the second staticmemory cell is diagnosed.
 6. The semiconductor device according to claim3, wherein the second voltage has a voltage value corresponding to thevoltage value of the first voltage when the stress is applied to thesecond static memory cell, and the second voltage has a voltage valuelower than the voltage value of the first voltage when the second staticmemory cell is diagnosed.
 7. The semiconductor device according to claim1, wherein the frequency of the stress applied to the second staticmemory cell is determined by time of the stress applied to the secondstatic memory cell.
 8. The semiconductor device according to claim 1,wherein the semiconductor device further includes a retaining circuitconfigured to retain a state of the second static memory cell so as tooutput the state retained in the retaining circuit.
 9. The semiconductordevice according to claim 1, wherein the monitor circuit includes astress voltage generating circuit, the monitor circuit instructs thevoltage generating circuit to apply stress to the second static memorycell during a period in which the semiconductor device operates so thata state of the second static memory cell can be notified.
 10. Thesemiconductor device according to claim 1, wherein the monitor circuitis configured to apply stress via a voltage applied to the second staticmemory cell during a period in which the semiconductor device operatesso that a state of the second static memory cell can be notified. 11.The semiconductor device according to claim 1, wherein the monitorcircuit is configured to apply stress to the second static memory cellto predict a failure.
 12. The semiconductor device according to claim 1,wherein the monitor circuit is configured to apply stress to the secondstatic memory cell to predict a failure by applying a stress voltage tothe second static memory cell.
 13. The semiconductor device according toclaim 1, wherein the monitor circuit is configured to apply stress tothe second static memory cell by applying a stress voltage having avoltage value greater than that of a power source voltage supplied tothe first memory cells, such that the degradation of a characteristicsof the first static memory cells is predicted.
 14. The semiconductordevice according to claim 1, wherein a period in which the first staticmemory operates including a period in which the reading or the writingis performed, with respect to a period in which the semiconductor deviceoperates comprises the frequency with which stress is applied to thesecond static memory cell.